Knowra Chemical vapor deposition Chemical vapor deposition Chemical vapor deposition is a process that forms a solid coating or material by reacting vapor-phase precursors at or near a surface. It can produce thin films with controlled composition and structure.
Chemical vapor deposition reactor : A chamber that supplies vapor precursors to a heated or activated surface and removes reaction products. Reactor geometry and gas flow govern precursor delivery and coating uniformity.
Chemical precursor : A starting substance that undergoes chemical transformation to produce a desired product. Its volatility and reactivity determine whether it can feed a vapor-phase deposition reaction.
Chemical vapor deposition of graphene : A method for growing graphene by decomposing carbon-containing vapors on a catalyst surface. It produces large-area graphene films, often on copper or nickel.
Physical vapor deposition : A family of coating methods that vaporize a solid source and condense its atoms or molecules onto a surface. Unlike CVD, PVD primarily transports vaporized source material rather than forming it through surface chemistry.
Surface reaction : A chemical transformation occurring at the boundary between a solid and its surroundings. Adsorption and reaction at the substrate form the deposited solid.
Substrate (materials science) : A solid surface or base on which a film, coating, or device structure is formed. Its composition, temperature tolerance, and surface condition affect film formation.
Silicon carbide : A hard, wide-bandgap semiconductor composed of silicon and carbon. CVD grows high-quality silicon carbide layers for power and high-temperature electronics.
Atomic layer deposition : A vapor-phase coating method that grows films through sequential, self-limiting surface reactions. ALD controls thickness by alternating precursor exposures rather than continuous co-delivery.
Mass transport : The movement of matter through fluids or across interfaces by diffusion, convection, or other transport processes. Transport can limit precursor supply and change deposition rates across a surface.
Thin film : A solid layer whose thickness is small relative to its lateral dimensions. Chemical vapor deposition is a major route for making thin films.
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